2007 Annual Meeting

Session: Plasma Processing

Chair

Vincent M. Donnelly, University of Houston

Co-Chair

Sumit Agarwal, Colorado School of Mines

Presentations

12:30 PM

(258a) In Situ Measurement Of The Ion Incidence Angle Dependence Of The Ion-Enhanced Etching Yield In Plasma Reactors
Rodolfo Jun Belen, Eray S. Aydil, Sergi Gomez, Mark Kiehlbauch

12:50 PM

(258b) Prediction Of Feature Profile Evolution In Shallow Trench Isolation Etching
John Hoang

01:10 PM

(258c) The Effect Of Oxygen Addition In A Chlorine Plasma During Shallow Trench Isolation Etch

01:30 PM

(258d) The Effect Of Polymerizing Chemistry And Ion Flux On Oxide Fencing, Line Edge Roughness, And Micro-Trenching In Nano-Scale Interconnect Structures For 45 Node Reactive Ion Etching Process
Ammar Alkhawaldeh

01:50 PM

(258e) Reaction Mechanisms In Patterning Hafnium-Based Metal Oxide Thin Films
Ryan M. Martin, Hans-Olof Blom

02:10 PM

(258f) Plasma Activation Of Polymer Surfaces For Enhanced Adhesion
Eleazar Gonzalez, Michael Barankin, Andrew G. Hsieh, Steve Babayan, Robert F. Hicks, John Gillespie, Joseph Deitzel

02:30 PM

(258g) Investigation Of Physical Vapor Deposited Ta / W Multilayer Structure As A Copper Diffusion Barrier
Prodyut Majumder