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Proceedings
2007 Annual Meeting
Materials Engineering and Sciences Division
Plasma Processing
(258c) The Effect Of Oxygen Addition In A Chlorine Plasma During Shallow Trench Isolation Etch

2007 Annual Meeting

(258c) The Effect Of Oxygen Addition In A Chlorine Plasma During Shallow Trench Isolation Etch

Proceedings

2007 Annual Meeting

Conference Type

AIChE Annual Meeting

Conference Year

2007

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Materials Engineering and Sciences Division

Session

Plasma Processing

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