2007 Annual Meeting
(258a) In Situ Measurement Of The Ion Incidence Angle Dependence Of The Ion-Enhanced Etching Yield In Plasma Reactors
Authors
Rodolfo Jun Belen - Presenter, Applied Materials
Eray S. Aydil - Presenter, University of Minnesota
Sergi Gomez - Presenter, Intel
Mark Kiehlbauch - Presenter, Micron