Lawson, R. A.

Authored

(614c) Negative Tone Photoresists Based On Cationic Polymerization for High Resolution Lithography
2010 Annual Meeting
(241f) Structure-Property Relations for the Design of Organic Glasses for Organic Electronics and Nanolithography
2010 Annual Meeting
(664f) Reactive Rinse Treatment to Enhance the Mechanical Properties of Photoresist Thin Film
2010 Annual Meeting
(4bu) Rational Design of Advanced Organic Materials
2010 Annual Meeting
(349b) Understanding the Relationship Between True and Measured Nanoscale Feature Size and Roughness Using a Detailed SEM Simulator
2010 Annual Meeting
(573e) Mesoscale Kinetic Monte Carlo Simulations of Molecular Glass Photoresists
2009 Annual Meeting
(207g) Modifying Properties of Polymer Nanostructure through Liquid Phase Reactive Treatments
2009 Annual Meeting
(651d) Diffusion and Mass Uptake Behavior of Polymer Thin and Ultra-Thin Films
2009 Annual Meeting
(633f) Diffusion And Relaxation Behavior Of Polymer Ultra-Thin Films: A Progress Report
2007 Annual Meeting
(5bc) Rational Design of Advanced Materials: Combining Modeling, Synthesis, Processing, and Characterization to Generate Superior Materials
2009 Annual Meeting
(628e) In-Situ Control of Cationic Polymerization Kinetics for Negative Tone Photoresists
2009 Annual Meeting
(581b) Mechanical Properties of Polymer Thin Films and Nanostructures
2009 Annual Meeting

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2007 Annual Meeting2009 Annual Meeting2010 Annual Meeting