2008 Annual Meeting

Session: Plasma Processing and Emerging Applications

Plasma Processing

Chair

Sumit Agarwal, Colorado School of Mines

Co-Chair

Jane P. Chang, University of California at Los Angeles

Presentations

12:30 PM

(310a) Compositional Tuning of Bimetallic Nanoparticles for Low Temperature Carbon Nanotube Growth
Wei-Hung Chiang, R. Mohan Sankaran

12:48 PM

(310b) Design of a High Throughput Microwave Plasma Reactor for Bulk Production of Metal Oxide Nanowires
Jeong H. Kim, Vivekanand Kumar, Mahendra K. Sunkara

01:06 PM

(310c) Modeling Plasma-Surface Interactions and Their Role In Inducing Structural Transitions In Materials
Dimitrios Maroudas

01:24 PM

(310d) 3-Dimensional Monte Carlo Profile Simulation and Experimental Measurements of Surface Roughness Under Plasma Etching
Wei Guo, Hiroyo Kawai, Herbert H. Sawin

01:42 PM

(310e) Simulation of Profile Evolution In Shallow Trench Formation by Plasma Etching
John Hoang, Jane P. Chang

02:00 PM

(310f) Molecular Dynamics Simulations of Plasma-Surface Interactions: Nanoscale Feature Etching on a Silicon Substrate
Joseph J. Végh, David B. Graves

02:18 PM

(310g) Stochastic Differential Charging and Its Effects on Charging Damage and Feature Profile Evolution during Plasma Processing
Eunsu Paek, Gyeong S. Hwang

02:36 PM

(310h) Coupling Gas Phase and Surface Reaction Kinetics In C4F8 and SF6 Plasmas Used for Si and SiO2 Etching
George Kokkoris, Evangelos Gogolides, Andy Goodyear, Mike Cooke