2006 AIChE Annual Meeting

Session: Semiconductor Surface Chemistry

This session will focus on fundamental chemistry on semiconductor surfaces.

Chair

Christos G. Takoudis, University of Illinois at Chicago

Co-Chair

John Ekerdt, University of Texas-Austin

Presentations

08:30 AM

(646a) Impact of Surface Chemistry and Mg:O Flux on Magnesium Oxide Thin Film Heteroepitaxy on Hexagonal Silicon Carbide for Integration of Functional Oxides

Trevor L. Goodrich, Zhuhua Cai, Katherine S. Ziemer

08:50 AM

(646b) Probing Interactions of Ge with Chemical and Thermal Si02 to Understand Selective Growth of Ge on Si during Molecular Beam Epitaxy

Qiming Li, Joshua L. Krauss, Stephen Hersee, Sang M. Han

09:10 AM

(646c) Investigations of Silane Adsorption and Reaction on Oxygen-Covered Metal Surfaces

Dylan C. Kershner, James Medlin

09:30 AM

(646d) Surface Chemistry for the Growth of Epitaxial Oxide Layers on Si(001)-2x1

A. C. Cuadra, D. B. Skliar, W. A. Tisdale III, Brian Willis

09:50 AM

(646e) Stm Manipulation and First Principles Simulation of a Molybdenum Disulfide Surface

Hua Ma, Jian Shu Yang, Wangzuo Shangguan, Natarajan Chandrasekhar, Mark Saeys

10:10 AM

(646f) Surface Chemistry of Ferroelectric Lithium Niobate

Yang Yun, Min Li, Jun Wang, Diana Liao, Lorenz Kampschulte, Eric Altman

10:30 AM

(646g) The Role of Dative Bonding in the Reactivity of Semiconductor and Metal Oxide Surfaces

Yuniarto Widjaja, Collin Mui, Atashi Mukhopadhyay, Charles B. Musgrave