McElwee-White, L.

Authored

(92c) Chemical Vapor Deposition of WNxCy for Diffusion Barrier Application Using a Tungsten Diphenylhydrazido Complex
2009 Annual Meeting
(586g) Decomposition of Aryl- and Alkylimido Precursors for the Cvd of Tungsten Nitride: a Combined Density Functional Theory and Experimental Study
2005 Annual Meeting
(566d) Tert-Butylimido-Tris(Diethylamido)Tantalum and Nh3 Precursor Combination for Ald of Tan for Barrier Applications
2005 Annual Meeting
(93b) Solvent Control of Surface Plasmon Mediated Chemical Deposition of Au Nanoparticles from Alkylgold Phosphine Complexes
2015 AIChE Annual Meeting Proceedings (ISBN: 978-0-8169-1094-6)
(206g) Deposition of WnXCY Using Allylimido Complexes CL4(Rcn)W(Nc3H5): Effect of Nh3 on Film Properties
2005 Annual Meeting

Related Proceedings

2005 Annual Meeting2009 Annual Meeting2015 AIChE Annual Meeting Proceedings