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  • Peer, M.

Lawson, R. A.

Affiliation
Georgia Institute of Technology
City
Atlanta
State
GA
Country
United States

Authored

(5bm) Single Molecule Chemically Amplified Photoresists for Nanolithography
2008 Annual Meeting
(26a) Diffusion, Mass Uptake, and Free Volume Behavior of Polymer Thin and Ultra-Thin Films
2008 Annual Meeting
(384f) Fundamental Diffusion Behavior of Polymer Ultrathin Films: Effect of Film Thickness, Molecular Weight, and Aging
2006 AIChE Annual Meeting

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2006 AIChE Annual Meeting2008 Annual Meeting

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