Skip to main content

AIChE The Global Home of Chemical Engineers

Join
Sign In

Communities
Membership
Events
Publications
Learning & Careers

AIChE Home
About
Contact AIChE
Leadership
Events
Communities
Membership
Learning & Careers
Publications

Careers at AIChE
Equity, Diversity, Inclusion
Giving
Students
Young Professionals
Operating councils
Local Sections
Committees
Awards

Communities
Membership
Events
Publications
Learning & Careers

Sign In Join

Breadcrumb

Home
Publications
Proceedings
Authors
Ort, D.

Bosworth, J. K.

Affiliation

Cornell University

City

Ithaca

State

NY

Country

United States

Authored

(264a) Bottom-Up Synthesis Of Device-Level Mesoporous Silica, Using Photolithography And Supercritical CO2

2007 Annual Meeting

Related Proceedings

2007 Annual Meeting

Follow AIChE

Instagram

Communities

CCPS Center for Chemical Process Safety
DIPPR Design Institute for Physical Properties
RAPID RAPID Manufacturing Institute
SBE Society for Biological Engineering
AMPs Advanced Manufacturing and Processing Society
CPE Community of Process Engineers
CEI Center for Energy Initiatives
CHS Center for Hydrogen Safety
CIEE Center for Innovation & Entrepreneuring Excellence
DIERS Design Institute for Emergency Relief Systems
IfS Institute for Sustainability
IMES International Metabolic Engineering Society
ISWS International Society for Water Solutions
RES Regenerative Engineering Society

More Communities

Learn more about IDEAL
Learn more about our Communities

AIChE

Join Sign In

Membership
Academy

About
Awards
Advertise
Code of Ethics
Careers at AIChE
Contact
Ethical Guidelines
Giving
Global
Press
Privacy & Security

120 Wall Street, FL 23
New York, NY 10005-4020

Other Sites & Tools

Engage
ChEnected
SmartBrief

Copyright © American Institute of Chemical Engineers.
All rights reserved.
AIChE® is a registered 501(c)(3). EIN: 13-1623892.