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Authors
Daifuku, T.

Gill, W. N.

Affiliation

Rensselaer Polytechnic Institute

City

Troy

State

NY

Country

United States

Authored

(323b) A Time Dependent Dielectric Breakdown (TDDB) Model for Field Accelerated Low-K Breakdown Due to COPPER Ions

2008 Annual Meeting

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2008 Annual Meeting

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