Willson, C. G.

Authored

(196aa) High-? Block Copolymers with High Etch Selectivity for Sub-10 Nm Patterning
2017 Annual Meeting (ISBN: 978-0-8169-1102-8)
(217es) Replicating Block Copolymer Patterns By Photochemical Transfer Printing
2013 AIChE Annual Meeting (ISBN: 978-0-8169-1110-3)
(4de) Electrically Induced Pillar Arrays Formed Using Photocurable Materials
2005 Annual Meeting
(4bi) Block Copolymer Patterns Replicated By Photochemical Transfer Printing
2013 AIChE Annual Meeting (ISBN: 978-0-8169-1110-3)
(382d) Silicon-Containing Block Copolymers for Sub-20 Nm Pitch Patterning
2013 AIChE Annual Meeting (ISBN: 978-0-8169-1110-3)
(365f) High Aspect Ratio Pillar Arrays Formed Via Electrohydrodynamic Instabilities
2005 Annual Meeting
(266f) Photochemical Transfer Printing of Block Copolymer Patterns
2013 AIChE Annual Meeting (ISBN: 978-0-8169-1110-3)

Related Proceedings

2005 Annual Meeting2013 AIChE Annual Meeting2017 Annual Meeting