2020 Virtual Spring Meeting and 16th GCPS

Session: Chemical Process Maintenance and Risk Reduction

Chair

Dinh, H., Honeywell UOP

Co-Chair

Zeng, L., Honeywell UOP

Presentations

11:00 AM

(105a) Seven Questions: The Essence of Hazops
Schmidt, M.

11:20 AM

(105b) Flare Instrumentation Minimum Expectations
Stuck, D., Boley, T.

11:40 AM

(105c) Chemical Process Maintenance and Risk Reduction - Open Discussion
Zeng, L.