2020 Virtual Spring Meeting and 16th GCPS

Session: Chemical Process Maintenance and Risk Reduction

Chair

Ha Dinh, Honeywell UOP

Co-Chair

Lixiao Zeng, Honeywell UOP

Presentations

11:00 AM

(105a) Seven Questions: The Essence of Hazops
Mike Schmidt

11:20 AM

(105b) Flare Instrumentation Minimum Expectations
Derek Stuck, Troy Boley

11:40 AM

(105c) Chemical Process Maintenance and Risk Reduction - Open Discussion
Lixiao Zeng