2019 Spring Meeting and 15th Global Congress on Process Safety

Session: Pressure Relief Design III

Chair

Nirupama Gopalaswami, Honeywell Process Solutions

Co-Chair

Ray Mentzer, Purdue Process Safety & Assurance Center

Presentations

03:30 PM

(46a) Comparison between Steady State and Dynamic Pressure Relief Calculations
Neil Prophet, Micah Wessels, Carlos Olivares

04:00 PM

(46b) Common Misunderstanding of Overpressure Protection Scenarios for Pressure Relief Valves
Anupol Paiboonruamsilp

04:30 PM

(46c) Evaluating Relief Requirements for Reactive Processes with Unstable Intermediates
Stacy Fields