Plasmas have broad applications in materials processing, such as etching, deposition and sterilization. An overview of various methods of producing low temperature plasmas will be presented, and will include a review of the physics and chemistry of radio frequency (RF) and microwave (MW) generated discharges. Included in the review will be a discussion of the electrical and chemical characteristics of atmospheric and low-pressure plasma, plasma stability and uniformity. Emerging applications for these technologies will also be reviewed, and compared with conventional processing techniques.
