2023 AIChE Annual Meeting

Session: Materials Interfaces - Celebrating the Career of John Ekerdt

Chair

Co-Chair

Gyeong Hwang, The University of Texas at Austin

Presentations

12:30 PM

(24a) Chemical Processing of Function Accelerated Nano-Materials at the Atomic Scale
Jane Chang

12:48 PM

(24b) Surface Reaction Kinetics during Area-Selective Thin Film Deposition
Gregory N. Parsons

01:06 PM

(24c) Controlling Nucleation and Selectivity in Atomic Layer Deposition for Materials Synthesis
Stacey Bent

01:24 PM

(24d) High Quality Tunable Plasmonic Nanostructures By Atomic Layer Deposition
Brian Willis, John A. Grasso, Rahul Raman

01:42 PM

(24e) Chemical “Engineerifying” Electronics
Michael A. Filler

02:00 PM

(24f) The Elusive Surface M2O7 Dimer Active Site
Israel Wachs

02:18 PM

(24g) The Dual Nature of Chemical Reaction Engineering
James Rawlings

02:36 PM

(24h) Plasma Enhanced Atomic Layer Deposition of Silicon Carbonitride
Samuel Johnson, John Ekerdt, Gyeong S. Hwang, Joaquin Resasco, Peter Ventzek, Tsung-Hsuan Yang, Jianping Zhao, Toshihiko Iwao, Charles Schlechte, John Carroll, Gabriel Blankemeyer