2019 AIChE Annual Meeting

Session: Vapor Phase Processing of Materials

This session solicits experimental, theoretical and computational papers on vapor phase deposition and processing of electronic materials. Submissions pertaining to the deposition methods (chemical, physical, atomic layer, etc.) and patterning/ etching of these materials are welcome.

Chair

Mededovic, S., Clarkson University

Co-Chair

Sunkara, M., University of Louisville

Presentations

03:30 PM

(45a) Halide Vapor Phase Epitaxy of III-V Semiconductors on Silicon Substrates
Calero-barney, S., Sunkara, M. K.

04:10 PM

(45c) Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
Fares, C., Ren, F., Hayes, D. C., Gila, B. P., Pearton, S.

04:30 PM

(45d) Au-Pd Alloys for Near-Infrared Hot Carrier Devices: Structural, Electronic and Optical Properties
McPeak, K., Stofela, S. K. F., Kizilkaya, O., Leite, T. R., Shelton, W. A. Jr., Sprunger, P. T., Baxter, J., Taheri, M. M.

04:50 PM

(45e) Scanning Electron Microscopy Measurements of the Luminescent and Electrical Properties of Thin Film Photovoltaic Devices
Harvey, T. B., Torabi, A.

05:10 PM

(45f) High-Temperature, High-Pressure Molecular Doping of Nanodiamond for Sensing Applications
Crane, M., Petrone, A., Beck, R., Lim, M., Zhou, X., Li, X., Stroud, R., Pauzauskie, P.