2019 AIChE Annual Meeting
(766c) Maximizing the Efficiencies of Metal-Insulator-Semiconductor (MIS) Photoelectrodes By Controlling the Flux of Charge Carriers with Interfacial Design
Authors
In this work we show that by tuning the thickness of the insulator even systems that suffer from moderate barrier heights can achieve high photovoltages1. This was done by designing insulators that minimize the interfacial flux of majority charge carriers (leading to recombination), without creating an overly large impediment for minority carriers to drive the reaction. This result shows that metals with non-ideal work function properties but optimal electrocatalytic activity can still achieve high photovoltages, and greatly improves the number of viable materials for use in MIS systems. Another strategy that has expanded the material phase space in MIS systems involves the introduction of bilayer metals2â4. This approach uses one metal layer to set the barrier height of the system, and another metal layer to provide stable electrocatalytic sites. In this work we show the additive benefits of a design approach that combines insulator thickness tuning with the bilayer metals, which further improves photovoltage and expands the set of useful materials. This was demonstrated experimentally using pSi-HfO2-Al-Pt and pSi-HfO2-Ti-Pt photocathode systems. The relevant interfacial mechanisms were captured using a comprehensive model that can be used to predict MIS performance.
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