2019 AIChE Annual Meeting
(623d) A Novel Nano-Lithographic Pathway for Fabricating Anisotropic Nanoparticles of Different Shape and Composition
Authors
The nano-lithographic method essentially followed a template directed approach using one of the most advanced thermal scanning probe lithographic instrument, NanoFrazor. This nanometer resolution mask writing tool was used to make a template in combination with dry reactive ion etching tool. The pattern shapes written by NanoFrazor were chosen according to the cross-sectional geometry of the final nanoparticles. The sizes of the nanoparticles had been controlled via optimisation of different parameters of NanoFrazor and dry etching step. Deposition of different metal/metal oxides by electron-beam evaporation method onto the templates allowed us to be flexible with choosing from a range of nano-materials according to the required functionality in the system. Dissolution of the sacrificial template lets the nanoparticles to be collected in a suitable solvent. The stability analysis of these nanoparticles made by the method will also be discussed along with relevant properties for using these particles in the coatings.