(493a) High Surface Area Silicon Quantum Dots Derived from Porous Silicon for Energetic Materials

Energetic porous silicon has emerged in the last fifteen years as a uniquely positioned formulation class featuring the increased energy density of metal-based fuels relative to monomolecular explosives, yet with exceedingly high energy release rates (1-3000 m/s flame speeds). Thus far, porous silicon is “on-chip”, etched from a silicon wafer, and is therefore compatible with MEMS fabrication techniques and ideal for augmenting conventional electronics, creating small-scale thrust or actuation, and replacing explosive initiators. However, this same “on-chip” nature also limits potential applications and effectively dilutes the specific energy density when considering its inert substrate base. Efforts to expand the technology off-chip have led to our fabrication of hydrogen-terminated silicon quantum dots derived from porous silicon. This work characterizes the nominally 5 nm Si nanoparticles with specific surface areas over 500 m²/g with open-channel flame speeds similar to on-chip porous silicon propagation rates with NaClO₄ oxidizer (exceeding 1 km/s). Continuing characterization and combustion performance evaluation efforts are summarized including microscopy, FTIR, bomb calorimetry, high-speed combustion videography, and effects of binders for additive manufacturing.