(595c) Activity and Productivity of Co ALD Catalysts for FTS

Significant advancement of FTS could allow for industrialization of GTL at a capacity having a considerable impact on the energy economy.  The gas phase deposition technology of Atomic layer deposition (ALD) is a thin film technology analogous to chemical vapor deposition.  Metallic Co ALD was utilized for a new type of highly-productive catalyst and reactor for valuable fuel products.  Avoiding reduction of Co₃O₄ to metallic Co eliminates processing temperatures above reaction temperature; this reduces the likelihood of sintering Co catalyst particles, and lowering productivity.  Product selectivity, conversion and productivity have been demonstrated for low weight loading Co catalysts having 5-11 wt% Co.