2011 Annual Meeting

Session: Gas Phase Deposition

Chair

Gupta, M., University of Southern California (USC)

Co-Chair

Swihart, M. T., University at Buffalo (SUNY)

Presentations

12:30 PM

(530a) Physical Vapor Transport of Aluminum Nitride On Silicon Carbide Substrates: Parameters Affecting Nucleation
Edgar, J. H., Du, L.

12:55 PM

(530b) Hot Wire Assisted Chemical Vapor Deposition (HWCVD) of Niobium Nitride Thin Films
Martínez, A., Jaramillo, D. F., Ortiz, P.

01:20 PM

(530c) Effect of Process Variables On Microestructure and Composition of HWCVD Tungsten Oxides Thin Films
Jaramillo, D. F., Martínez, A., Araujo, A. M., Ortiz, P.

01:45 PM

(530d) High-Pressure Chemical Deposition of Silicon In Extreme Aspect-Ratio Micro-Capillaries
Keshavarzi, B., Baril, N., Borhan, A.

02:10 PM

(530e) Initiated Chemical Vapor Deposition of Polymer Thin Films for Photolithography Applications