2011 Annual Meeting

Session: Gas Phase Deposition

Chair

Malancha Gupta, University of Southern California (USC)

Co-Chair

Mark T. Swihart, University at Buffalo (SUNY)

Presentations

12:30 PM

(530a) Physical Vapor Transport of Aluminum Nitride On Silicon Carbide Substrates: Parameters Affecting Nucleation
J. H. Edgar, Li Du

12:55 PM

(530b) Hot Wire Assisted Chemical Vapor Deposition (HWCVD) of Niobium Nitride Thin Films
Alejandro Martínez, Daniel F. Jaramillo, Pablo Ortiz

01:20 PM

(530c) Effect of Process Variables On Microestructure and Composition of HWCVD Tungsten Oxides Thin Films
Daniel F. Jaramillo, Alejandro Martínez, Ana M. Araujo, Pablo Ortiz

01:45 PM

(530d) High-Pressure Chemical Deposition of Silicon In Extreme Aspect-Ratio Micro-Capillaries
Banafsheh Keshavarzi, Neil Baril, Ali Borhan

02:10 PM

(530e) Initiated Chemical Vapor Deposition of Polymer Thin Films for Photolithography Applications