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Proceedings
2009 Annual Meeting
Materials Engineering and Sciences Division
Reaction Kinetics and Reaction Engineering for Electronic and Photonic Devices
2009 Annual Meeting
Session: Reaction Kinetics and Reaction Engineering for Electronic and Photonic Devices
Co-Chair
Gyeong S. Hwang
, The University of Texas at Austin
Presentations
08:30 AM
(53a) Quantum Chemical and in Situ Raman Studies for the Homogeneous Thermal Decomposition Kinetics of Triethylgallium
Jooyoung Lee, Young Seok Kim, Tim J. Anderson
08:55 AM
(53b) Atomistic Modeling of Tin Surface and Grain Boundary Diffusion
Michael S. Sellers, David Kofke, Cemal Basaran
09:20 AM
(53c) A Comparison of Various Free Energy Models for Oxide Precipitation in Crystalline Silicon
Rubal Dua
09:45 AM
(53d) New Mechanism for Optically Stimulated Diffusion in Ultra-Shallow Junction Formation
Prashun Gorai, Yevgeniy Kondratenko
10:10 AM
(53e) Time Dependent Dielectric Breakdown of Interlayer Dielectrics with Barriers
Ravi Achanta, William N. Gill
10:35 AM
(53f) Kinetics of Wet Thermal Oxidation of 6H Silicon Carbide
