2008 Annual Meeting

Session: Plasma-Assisted and Thermal Chemical Vapor Deposition

Deposition of thin films using thermal decomposition of metal-organic and organometallic precursors. Characterization of films deposited from CVD.

Chair

Han, S. M., University of New Mexico

Co-Chair

Ekerdt, J., University of Texas-Austin

Presentations

03:15 PM

(370a) An Analysis of the Deposition Mechanisms Involved during Self-Limiting Growth of Metal Oxides by Pulsed PECVD

Seman, M. T., Richards, D. N., Wolden, C.

03:35 PM

(370b) Kinetic Monte Carlo Simulations of Surface Growth during Plasma Deposition of Silicon Thin Films

Pandey, S. C., Singh, T., Maroudas, D.

03:55 PM

(370c) Investigation of the Growth Mechanism during Plasma-Assisted Deposition of a-C:H

Jariwala, B. N., Ciobanu, C. V., Agarwal, S.

04:15 PM

(370d) Remote Atmospheric Pressure Plasma Activation of Polymers

Gonzalez, E. II, Barankin, M., Guschl, P. C., Hicks, R. F.

04:35 PM

(370e) Thin-Film Deposition on Nanoparticles and Nanowires In Low-Pressure Plasma

Shahravan, A., Matsoukas, T.

04:55 PM

(370f) Multiferroic BiFeO3 Thin Films Deposited by MOCVD Method

Singh, M., Yang, Y., Takoudis, C. G.

05:15 PM

(370g) Interesting Characteristics of a Vapor-Deposited Silica Thin Film

Anderson, A., Ashurst, W. R.