2008 Annual Meeting

Session: Plasma-Assisted and Thermal Chemical Vapor Deposition

Deposition of thin films using thermal decomposition of metal-organic and organometallic precursors. Characterization of films deposited from CVD.

Chair

Sang M. Han, University of New Mexico

Co-Chair

John Ekerdt, University of Texas-Austin

Presentations

03:15 PM

(370a) An Analysis of the Deposition Mechanisms Involved during Self-Limiting Growth of Metal Oxides by Pulsed PECVD
Michael T. Seman, David N. Richards, Colin Wolden

03:35 PM

(370b) Kinetic Monte Carlo Simulations of Surface Growth during Plasma Deposition of Silicon Thin Films
Sumeet C. Pandey, Tejinder Singh, Dimitrios Maroudas

03:55 PM

(370c) Investigation of the Growth Mechanism during Plasma-Assisted Deposition of a-C:H
Bhavin N. Jariwala, Cristian V. Ciobanu, Sumit Agarwal

04:15 PM

(370d) Remote Atmospheric Pressure Plasma Activation of Polymers
Eleazar Gonzalez, Michael Barankin, Peter C. Guschl, Robert F. Hicks

04:35 PM

(370e) Thin-Film Deposition on Nanoparticles and Nanowires In Low-Pressure Plasma
Anaram Shahravan, Themis Matsoukas

04:55 PM

(370f) Multiferroic BiFeO3 Thin Films Deposited by MOCVD Method
Manish Singh, Yi Yang, Christos G. Takoudis

05:15 PM

(370g) Interesting Characteristics of a Vapor-Deposited Silica Thin Film
A. Anderson, W. Robert Ashurst