2008 Annual Meeting

Session: Atomic Layer Deposition

Atomic Layer Deposition This oral presenter session welcomes papers from a broad range of topics related to ALD including: equipment design, new precursor chemistries, new materials, new applications, and computational and experimental studies of chemical mechanisms and reaction pathways associated with ALD.

Chair

Brian Willis, University of Connecticut

Co-Chair

Charles Musgrave, Stanford University

Presentations

08:30 AM

(204a) Molecular Layer Deposition of Nanoscale Organic Films
Paul W. Loscutoff, Stacey F. Bent

08:55 AM

(204b) Ald Copper-Palladium Thin Films for Molecular Electronics
Irene Hsu, Brian G. Willis

09:20 AM

(204c) Lanthanum Stabilization of Ald-Grown Hafnia
John Ekerdt, Tuo Wang

09:45 AM

(204d) Atomic Layer Deposited Y2O3 Thin Films Using Novel Cyclopentadienyl-Type Yttrium Precursor
Christos G. Takoudis

10:10 AM

(204e) Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetraisopropoxide and Ozone
Sumit Agarwal, Vikrant R. Rai

10:35 AM

(204f) Effect of Yb3+ Co-Doping on the Luminescent Properties of Er3+ :Y2O3 Thin Films
John Hoang, Jane P. Chang