2007 Annual Meeting

Session: Atomic Layer Deposition

Chair

Charles Musgrave, Stanford University

Presentations

03:30 PM

(456a) First Priniciples Calculation Of Atomic Layer Deposition Of HfO2
Atashi Mukhopadhyay, Javier Fdez. Sanz, Charles Musgrave

03:55 PM

(456b) Atomic Layer Deposition Of Optically Active Zno And TiO2 Nanothick Films On Particles
David M. King, Xinhua Liang, Xiaohua Du, Jarod A. McCormick, Alan W. Weimer, Steven M. George

04:20 PM

(456c) Material Characteristics And Electrical Properties Of Hafnium Silicate Films Synthesized By Plasma Enhanced Atomic Layer Deposition
Jiurong Liu, Ryan M. Martin, Monica Sawkar

04:45 PM

(456d) Quantum Molecular Dynamics Simulations Of The Ald Of HfO2
Charles Musgrave, Atashi Mukhopadhyay, Javier Sanz

05:10 PM

(456e) Surface Reaction Engineering For Oxide Heteroepitaxy On Si(100)-2x1
Brian G. Willis, D.B. Skliar, A. Mathew