Block copolymer thin films provide the opportunity to design materials ideal for nanoscale applications based on their ability to self-assemble into periodic structures. This session focuses on the manipulation of thin film copolymer ordering using surfaces, electric fields, solvent annealing, topographical patterns, mechanical shearing, or other methods. Both experimental and theoretical works are welcome, and should highlight the characterization of thin film morphologies and provide useful insights into nanostructure formation.
03:15 PM
03:20 PM
George J. Papakonstantopoulos, Kostas Daoulas, Francois Detcheverry, Marcus Mueller, Paul F. Nealey, Juan J. de Pablo
03:40 PM
Eric Cochran, Gila E. Stein, Glenn H. Fredrickson, Edward J. Kramer
04:00 PM
Yuefei Tao, Bradley Olsen, Rachel A. Segalman
04:20 PM
Hugh W. Hillhouse, Vikrant N. Urade, Michael Tate
04:45 PM
Connie B. Roth, John M. Torkelson
05:05 PM
Ning Wu, Leonard Pease, William. B. Russel
05:25 PM
Jianbin Zhang, Tim Lodge, Christopher W. Macosko