Papers are solicited on the subject of low-temperature plasmas widely used in fabrication of integrated circuits, micro/nanoelectromechanical systems, and optoelectronic devices. This session will feature both modeling and experimental papers. Paper submission is encouraged in the areas of, but not limited to, plasma physics, gas phase and surface chemistry, kinetics and transport phenomena, plasma-surface interactions, diagnostics, process control, and other emerging areas of plasma science and engineering (e.g., flexible substrate electronics and photovoltaics, plasma treatment of biocompatible surfaces, environmentally benign plasma processing, and microdischarges).
03:15 PM
Chihiro Fushimi, Kazuhiko Madokoro, Shuiliang Yao, Yuichi Fujioka, Koichi Yamada
03:40 PM
Axel Sonnenfeld, Philipp Rudolf von Rohr
04:05 PM
Mary Gilliam, Andrew Ritts, Qingsong Yu
04:30 PM
Ta-Chin Wei, Chi-Hung Liu
04:55 PM
Jin Zhang, YenFong Chan, Qingsong Yu