Atomic Layer Deposition is a film growth technology that is capable of depositing uniform and conformal films with atomic precision. It is rapidly growing field with applications in many fields related to chemical engineering. This session will include talks from both electronic materials processing as well as other areas of application. Topics including kinetic analyses, modeling, surface adsorption studies, process integration, and equipment development issues are strongly encouraged.
03:15 PM
Ramarajesh R. Katamreddy, Ronald Inman, Gregory Jursich, Axel Soulet, Christos G. Takoudis
03:35 PM
Atashi Mukhopadhyay, Javier Sanz, Charles B. Musgrave
03:55 PM
John Hoang, Trinh T. Van, Monica Sawkar, John Bargar, Jane P. Chang
04:15 PM
Shenghong Qiu, Thomas L. Starr
04:35 PM
Gregory Parsons, David B. Terry, Kie Jin Park
04:55 PM
Monica Sawkar, Jane P. Chang
05:15 PM
Ashwini Sinha, Dennis Hess, Clifford L. Henderson