2005 Annual Meeting

Session: Simulation and Control of Electronic Materials Manufacturing Systems

Chair

Antonios Armaou, Pennsylvania State University

Presentations

12:30 PM

(375a) Using High Fidelity Simulation in the Design of Experiments for Optimizing Etch Uniformity in Plasma Etching Reactors
Nirmal Tatavalli Mittadar, Demetre J. Economou, Andrew D. Bailey III, Simon McClatchie, Jingang Yi, Puneet Yadav

12:55 PM

(375b) Application of a Geometrically-Based Uniformity Criterion for Film Uniformity Optimization in a Planetary Gallium Nitride Cvd System
Rinku P. Parikh, Raymond A. Adomaitis

01:20 PM

(375c) Effects of Sampling Rate, Metrology Delay and Process Hold on the Stability of Run-to-Run Control
An-Jhih Su, Cheng-Ching Yu, Babatunde A. Ogunnaike

01:45 PM

(375d) A New Bayesian Approach for Improved State Estimation in Semiconductor Manufacturing Processes
Jin Wang, Q. Peter He

02:10 PM

(375e) Pls Based Run-to-Run Controller
Fan Wang