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Proceedings
2005 Annual Meeting
Materials Engineering and Sciences Division
Reactor Design and Analysis for Electronic Materials
2005 Annual Meeting
Session: Reactor Design and Analysis for Electronic Materials
Chair
Constantinos Theodoropoulos
, University of Manchester
Co-Chair
Roger P. Pawlowski
, Sandia National Laboratories
Presentations
12:30 PM
Welcoming Remarks
12:32 PM
(609a) Gallium Nitride Thin Film Growth Chemistry Modeling and Experimental Validation within a Movpe Reactor Showerhead System
Rinku P. Parikh, Raymond A. Adomaitis, Gary W. Rubloff, Erin Robertson, Deborah Partlow, Darren Thomson, Michael Aumer
12:57 PM
(609b) Development of Generalized Design Criteria for Vertical Chemical Vapor Deposition Reactors
Joungmo Cho, T. J. Mountziaris
01:22 PM
(609c) Computational Fluid Dynamics (CFD) Modeling of a Laser-Driven Aerosol Reactor
Yuanqing He, Suddha S. Talukdar, Mark T. Swihart
01:47 PM
(609d) Experimental Results from a Spatially Programmable Chemical Vapor Deposition System
Ramaswamy Sreenivasan, Raymond A. Adomaitis, Gary W. Rubloff, Yuhong Cai
02:12 PM
(609e) Non-Lithographic Micropatterning of Thin Crystal Film Layers and Bulk Micro-Machining Via Hydrogel Stamping
Stoyan K. Smoukov, Christopher J. Campbell, Kyle J.M. Bishop, Bartosz A. Grzybowski
02:37 PM
Concluding Remarks
