2005 Annual Meeting

Session: Chemical Vapor Deposition I

Chair

Daniel D. Burkey, Northeastern University

Co-Chair

David S. Dandy, Colorado State University

Presentations

12:30 PM

Welcoming Remarks

12:35 PM

(206a) Preparation of Hydrophobic Multilayers on Solid Surfaces
Jeff Chinn, Anfeng Wang, Xuemei Liang, Ting Cao, Haiying Tang, Steven O. Salley, Gregory W. Auner, K. Y. Simon Ng

12:55 PM

(206b) in Situ Real-Time Diagnostics for Studying the Structural Evolution of Nanocrystalline Silicon Thin Films during Plasma Deposition
Radhika C. Mani, Eray S. Aydil

01:15 PM

(206c) Roll-to-Roll Initiated Chemical Vapor Deposition (Icvd) of Functional, Flexible Nanomaterials
Malancha Gupta

01:35 PM

(206d) On-Line Apcvd of Sno2 Coatings on Glass
Mingheng Li, James W. McCamy

01:55 PM

(206e) Metal Organic Chemical Vapor Deposition of Titanium Oxynitride Films Using Tetrakis(Diethylamino)Titanium
Xuemei Song

02:15 PM

(206f) Chemical Vapor Deposition of Palladium Seed Layers
Gregory L. Griffin, Lidong Wang

02:35 PM

(206g) Deposition of WnXCY Using Allylimido Complexes CL4(Rcn)W(Nc3H5): Effect of Nh3 on Film Properties
Hiral M. Ajmera, Tim J. Anderson, Laurel L. Reitfort, Lisa McElwee-White

02:55 PM

Concluding Remarks