2005 Annual Meeting

Session: Atomic Layer Deposition

Chair

Charles B Musgrave, Stanford University

Co-Chair

Bridget R. Rogers, Vanderbilt University

Presentations

08:00 AM

(566a) Controlled Doping in Ultra-Thin Metal Oxide Films by Radical-Enhanced Ald
Trinh T. Van, Roman Ostroumov, Kang Wang, John Bargar

08:30 AM

(566b) Atomic Layer Deposition and Film Characterization of Aluminum Oxide Grown on Si Using Tris(Diethylamino)Aluminum Precursor and Water
Ramarajesh R. Katamreddy, Ronald Inman, Axel Soulet

09:00 AM

(566c) Chemical Mechanisms of Contamination in Atomic Layer Deposition of Hfo¬2
Atashi Mukhopadhyay

09:30 AM

(566d) Tert-Butylimido-Tris(Diethylamido)Tantalum and Nh3 Precursor Combination for Ald of Tan for Barrier Applications
KeeChan Kim, Tim J. Anderson, Lisa McElwee-White

10:00 AM

(566e) Area Selective Atomic Layer Deposition Using Photodefinable Polymer Masks
Clifford L. Henderson, Dennis Hess, Ashwini Sinha