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Proceedings
2005 Annual Meeting
Materials Engineering and Sciences Division
Atomic Layer Deposition
2005 Annual Meeting
Session: Atomic Layer Deposition
Chair
Charles B Musgrave
, Stanford University
Co-Chair
Bridget R. Rogers
, Vanderbilt University
Presentations
08:00 AM
(566a) Controlled Doping in Ultra-Thin Metal Oxide Films by Radical-Enhanced Ald
Trinh T. Van, Roman Ostroumov, Kang Wang, John Bargar
08:30 AM
(566b) Atomic Layer Deposition and Film Characterization of Aluminum Oxide Grown on Si Using Tris(Diethylamino)Aluminum Precursor and Water
Ramarajesh R. Katamreddy, Ronald Inman, Axel Soulet
09:00 AM
(566c) Chemical Mechanisms of Contamination in Atomic Layer Deposition of Hfo¬2
Atashi Mukhopadhyay
09:30 AM
(566d) Tert-Butylimido-Tris(Diethylamido)Tantalum and Nh3 Precursor Combination for Ald of Tan for Barrier Applications
KeeChan Kim, Tim J. Anderson, Lisa McElwee-White
10:00 AM
(566e) Area Selective Atomic Layer Deposition Using Photodefinable Polymer Masks
Clifford L. Henderson, Dennis Hess, Ashwini Sinha
