2005 Annual Meeting

(189d) Preview of Cpc7, the 7th International Conference on Chemical Process Control

Author

Thomas A. Badgwell - Presenter, Aspen Technology, Inc.


CPC7 will be held January 8-13, 2006, in Lake Louise, Canada, with the theme "Assessment of Core Technologies and Emerging Applications."

The overall goal of the CPC conference series is to evaluate current progress in the process control field and to identify new intellectual challenges that may have a fundamental impact on future industrial practice. Specific goals of CPC 7 include:

  1. Assess the current state of process control theory and practice.
  2. Present tutorial overviews for non-specialists in relevant areas of systems and control theory, particularly emerging and new areas.
  3. Provide a forum for in-depth discussions between university researchers, industrial practitioners and commercial control technology vendors.
  4. Expose practitioners and vendors to significant new tools emerging from the research community to stimulate wider implementation.
  5. Present promising research directions for the next decade.
  6. Evaluate needs and challenges in the process industries for the next decade.
  7. Evaluate opportunities for applications in non-traditional industries.
  8. Evaluate the current status of process control education at the undergraduate and graduate levels.